THE INFLUENCE OF IMPLANTED DOPANTS ON STRESSES AND DIFFUSION-PROCESSES IN NIO FILMS DURING THERMAL-OXIDATION OF NI

被引：21

作者：

LOISON, D

PIVIN, JC

CHAUMONT, J

ROQUESCARMES, C

机构：

[1] CTR SPECTROMETRIE NUCL & SPECTROMETRIE MASSE,LAB RENE BERNAS,F-91406 ORSAY,FRANCE

[2] ECOLE NATL SUPER MECAN & MICROTECH,MICROANAL SURFACES LAB,F-25030 BESANCON,FRANCE

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH | 1983年 / 209卷 / MAY期

关键词：

D O I：

10.1016/0167-5087(83)90908-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：975 / 981

页数：7

共 21 条

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