CURRENT AND POTENTIAL DISTRIBUTIONS IN PLATING CORROSION SYSTEMS

被引：21

作者：

SMYRL, WH

NEWMAN, J

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

[2] UNIV CALIF BERKELEY,LAWRENCE BERKELEY LAB,DIV MAT & MOLEC RES,BERKELEY,CA 94720

[3] UNIV CALIF BERKELEY,DEPT CHEM ENGN,BERKELEY,CA 94720

来源：

关键词：

D O I：

10.1149/1.2132613

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1423 / 1432

页数：10

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[4]

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[5]

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[6]

FLECK RN, 1964, UCRL11612

[7]

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[8]

KHAN AA, 1969, PLATING, V56, P1374

[9]

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[10]

Levich B., 1962, PHYSIOCHEMICAL HYDRO