ION-ASSISTED DEPOSITION OF ALUMINUM NITRIDE ON THE FLUOROZIRCONATE GLASS-SURFACE

被引：2

作者：

DAI, YS

KAWAGUCHI, T

OSUKA, T

TADA, M

SUZUKI, K

SUZUKI, S

MASUI, A

机构：

[1] ASAHI GLASS CO LTD, RES CTR, YOKOHAMA 221, JAPAN

[2] ASAHI GLASS CO LTD, CTR ADV GLASS RES & DEV, YOKOHAMA 221, JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1991年 / 30卷 / 7B期

关键词：

FLUOROZIRCONATE FLASS; ION-ASSISTED DEPOSITION; ALUMINUM NITRIDE; HUMIDITY RESISTANCE; DYNAMIC MIXING;

D O I：

10.1143/JJAP.30.L1314

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Aluminum nitride films were grown on the surface of the fluorozirconate glass by an ion-assisted deposition (IAD) method. The films did not affect the infrared transmission of the glass. The Al-N bonding in the films was confirmed by the IR absorption band centered around 650 cm-1. The absorption decreased with assist ion beam current, which is attributed to the reduction of film thickness by the sputtering effect and agrees well in trend with the changes in visible transmission and thickness. The glass surface with the films exhibits good resistance to himidity.

引用

页码：L1314 / L1316

页数：3

共 8 条

[1] VIBRATIONAL-SPECTRA AND STRUCTURE OF FLUOROZIRCONATE GLASSES [J].