EFFECTS OF HEAT-TREATMENT AND PLASTIC-DEFORMATION ON PHOTOELECTRONIC PROPERTIES OF HIGH-RESISTIVITY GAAS=CR

被引：10

作者：

LIN, AL ^{[1
]}

BUBE, RH ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT MAT SCI & ENGN,STANFORD,CA 94305

来源：

JOURNAL OF APPLIED PHYSICS | 1975年 / 46卷 / 12期

关键词：

D O I：

10.1063/1.321564

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5302 / 5304

页数：3

共 25 条

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