BORONTRIMETHYL-B(CH3)3 - A LESS HAZARDOUS SUBSTANCE FOR BORONIZATION

Boronization, i.e. plasma induced deposition of amorphous boron containing carbon films a-C/B:H on all inner surfaces of fusion devices, has proven to be a powerful conditioning method to achieve very pure fusion plasmas. The use of the highly toxic and explosive gas diborane (B2H6) in conventional boronization requires considerable precautions for safe handling. We report on a new technique for boronization, using less hazardous organic boron compounds, namely borontrimethyl B(CH3)3 and borontriethyl B(C2H5)3. First results indicate that films can be produced from borontrimethyl showing a performance in fusion devices similar to that of layers produced in the conventional way. The new technique thus offers an easier and more convenient way for the boronization of surfaces.