CO/X MULTILAYERS, NMR-STUDY OF MICROSCOPIC STRUCTURE AND STRAIN

被引:9
作者
DEGRONCKEL, HAM [1 ]
BIENERT, JAM [1 ]
DENBROEDER, FJA [1 ]
DEJONGE, WJM [1 ]
机构
[1] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS
关键词
D O I
10.1016/0304-8853(91)90383-L
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Co/X multilayers (X = Ir, Au, Cu, Pd) were investigated by NMR. All multilayers contained mainly fcc Co. A significant number of stacking faults is present giving a positive contribution to the magnetic volume anistropy. In Co/Cu a linear dependence of the strain on the inverse Co thickness was observed. This might give rise to an apparent interface anisotropy. Signals due to interface atoms in Co/Cu indicate an atomic roughness of the interfaces of about one atomic distance.
引用
收藏
页码:457 / 461
页数:5
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