ANGULAR-DISTRIBUTIONS OF N-2 IN THE PHOTODISSOCIATION OF N2O ADSORBED ON A PARTIALLY OXIDIZED SI(100) SURFACE AT 95 K

The time-of-flight distributions of the N-2 photofragment produced in the UV photodissociation of N2O adsorbed on a partially oxidized Si(100) surface at 95 K have been measured as a function of the desorption angle. Photoinduced electron transfer initiates the dissociation of N2O to produce an adsorbed oxygen atom and energetic N-2 desorbing from the surface. Interestingly, the angular distribution of N-2 originating from chemisorbed N2O molecules is peaked at approximate to 32 degrees from the surface normal. The results are discussed on the basis of bonding geometry and photodissociation dynamics of N2O.