CHARACTERIZATION OF ULTRATHIN PLATINUM OVERLAYERS DEPOSITED ON A W(110) SURFACE

被引：22

作者：

SHIVAPRASAD, SM ^{[1
]}

DEMMIN, RA ^{[1
]}

MADEY, TE ^{[1
]}

机构：

[1] NBS,DIV SURFACE SCI,GAITHERSBURG,MD 20899

来源：

THIN SOLID FILMS | 1988年 / 163卷

关键词：

Electrons; -; Diffraction; Spectroscopy; Auger Electron - Tungsten and Alloys - Surfaces;

D O I：

10.1016/0040-6090(88)90454-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The growth of platinum overlayers (sub-monolayer to multiple layer coverages) on a clean W(110) surface is studied by Auger electron spectroscopy (AES) and temperature programmed desorption (TPD). Based on Auger peak amplitudes, thermally evaporated platinum appears to grow in the Frank-van der Merve mode on W(110), at least for the first few layers. Annealing of platinum deposited at 90 K shows distinct changes in Auger ratios and adsorption states of molecular CO, providing evidence for changes in the electronic and structural properties of the overlayers. Annealing above 1500 K produces a stable monolayer of platinum on the tungsten surface for all initial platinum coverages greater than one monolayer. Preliminary low energy electron diffraction (LEED) studies are consistent with the observed trends in the structure of the platinum overlayers on W(110).

引用

页码：393 / 397

页数：5

共 19 条

[1] EPITAXY OF METALS ON METALS [J].