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A NEW OPTICAL METHOD FOR INVESTIGATION OF THIN METAL-FILMS

被引：8
作者：
KROO, N
KRIEGER, W
LENKEFI, Z
SZENTIRMAY, Z
THOST, JP
WALTHER, H
机构：
[1] HUNGARIAN ACAD SCI, SOLID STATE PHYS RES INST, H-1525 BUDAPEST, HUNGARY
[2] MAX PLANCK INST QUANTUM OPT, D-85740 GARCHING, GERMANY
来源：
SURFACE SCIENCE | 1995年 / 331卷
关键词：
METAL-INSULATOR INTERFACES; PLASMONS; POLYCRYSTALLINE THIN FILMS; SILVER; SURFACE WAVES;
D O I：
10.1016/0039-6028(95)00138-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
A new optical method: the spatial intensity distribution measurement and analysis of light, emitted by surface plasmons excited at resonance conditions in an ATR equipment was tested at 632.8 and 1064 nm wavelengths. Other methods to determine the plasmon decay length (scanning tunnel microscopy and the width of ATR curves) resulted in similar values for 30-80 nm thick Ag and Au films. An example of application is demonstrated.
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页码：1305 / 1309
页数：5
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