MODIFIED ELEMENTAL SENSITIVITY FACTORS FOR AUGER-ELECTRON SPECTROSCOPY

被引：23

作者：

PAYLING, R

机构：

来源：

关键词：

D O I：

10.1016/0368-2048(85)80010-4

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：99 / 104

页数：6

共 8 条

[1]

DAVIS LE, 1978, HDB AUGER ELECTRON S

HALL, PM ;

MORABITO, JM ;

CONLEY, DK .

[3] MATRIX EFFECTS IN QUANTITATIVE AUGER ANALYSIS OF DILUTE ALLOYS [J].

HALL, PM ;

MORABITO, JM .

[4]

HODGMAN CD, 1960, HDB CHEM PHYSICS, P2131

[5] DEPTH PROFILING IN THE INVESTIGATION OF INDUSTRIAL-PROCESSES [J].

MERCER, PD ;

PAYLING, R .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1981, 191 (1-3) :283-288

[6]

Seah M. P., 1979, Surface and Interface Analysis, V1, P2, DOI 10.1002/sia.740010103

[7]

WEAST RC, 1974, HDB CHEM PHYSICS, pB63

[8]

1976, POWDER DIFFRACTION D