DOSE AND ENERGY-DEPENDENCE OF IMPLANTED ION PROFILES (9 LESS-THAN-OR-EQUAL-TO Z1 LESS-THAN-OR-EQUAL-TO 83) IN THE AZ111 PHOTORESIST

被引:34
作者
GUIMARAES, RB
BEHAR, M
LIVI, RP
DESOUZA, JP
AMARAL, L
ZAWISLAK, FC
FINK, D
BIERSACK, JP
机构
[1] HAHN MEITNER INST KERNFORSCH BERLIN GMBH, D-1000 BERLIN 39, FED REP GER
[2] HAHN MEITNER INST KERNFORSCH BERLIN GMBH, D-1000 BERLIN 39, FED REP GER
关键词
D O I
10.1016/S0168-583X(87)80176-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:882 / 886
页数:5
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