PHOTOCHEMISTRY OF ARGON MATRICES CONTAINING NITRIC-OXIDE AND CARBONYL SULFIDE .1. THE PHOTOLYSIS OF THE NITRIC-OXIDE DIMER, CIS-N2O2

被引:63
作者
HAWKINS, M [1 ]
DOWNS, AJ [1 ]
机构
[1] UNIV OXFORD,INORGAN CHEM LAB,OXFORD OX1 3QR,ENGLAND
关键词
D O I
10.1021/j150652a017
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
引用
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页码:1527 / 1533
页数:7
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