GREG - A NEW HOTWALL-CLOSE-SPACED VAPOR TRANSPORT DEPOSITION SYSTEM

被引：26

作者：

MENEZES, C ^{[1
]}

FORTMANN, C ^{[1
]}

CASEY, S ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT MAT SCI,STANFORD,CA 94305

来源：

关键词：

D O I：

10.1149/1.2113937

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：709 / 711

页数：3

共 21 条

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