FLUX-PINNING MECHANISMS IN THIN-FILMS OF YBA2CU3OX

被引:112
作者
HYLTON, TL
BEASLEY, MR
机构
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 16期
关键词
D O I
10.1103/PhysRevB.41.11669
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We consider data from several experiments taken at very small induction in order to discern the nature of the pinning interaction in some thin-film samples of YBa2Cu3Ox with very large critical current densities. Analysis of typical pinning energies and critical current densities indicate that the pinning is due to a large density of point defects. We propose a simple model of pinning by point defects in the CuO2 planes that predicts a spacing between defects of 53. This large defect density may help to explain other properties of these films. © 1990 The American Physical Society.
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页码:11669 / 11672
页数:4
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