LOW-TEMPERATURE EPITAXIAL-GROWTH AND PHOTOLUMINESCENCE CHARACTERIZATION OF GAN

被引:15
作者
DISSANAYAKE, A [1 ]
LIN, JY [1 ]
JIANG, HX [1 ]
YU, ZJ [1 ]
EDGAR, JH [1 ]
机构
[1] KANSAS STATE UNIV AGR & APPL SCI,DEPT CHEM ENGN,MANHATTAN,KS 66506
关键词
D O I
10.1063/1.112729
中图分类号
O59 [应用物理学];
学科分类号
摘要
Epitaxial layers of GaN on sapphire substrates have been grown by metalorganic chemical-vapor deposition at a deposition temperature as low as 400 degrees C, which is the lowest temperature for successful epitaxial growth of GaN by any technique. This is achieved by controlling the low flow rate of the source gases and by first depositing an AIN buffer layer at 400 degrees C. Low-temperature photoluminescence measurements have been employed to study the optical properties of the films deposited at different temperatures. (C) 1994 American Institute of Physics.
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页码:2317 / 2319
页数:3
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