AN ALL-ROUND PERFORMER IN THE PHYSICAL VAPOR-DEPOSITION LABORATORY

被引：21

作者：

MUNZ, WD

VANNISSELROY, K

TIETEMA, R

HURKMANS, T

KEIREN, G

机构：

[1] Hauzer Techno Coating Europe B.V., NL-5900 AE Venlo

来源：

SURFACE & COATINGS TECHNOLOGY | 1993年 / 58卷 / 03期

关键词：

D O I：

10.1016/0257-8972(93)90009-D

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Physical vapour deposition (PVD) technology is enjoying an ever-expanding range of applications. New materials are being developed. Process technology is being better understood. The HTC 625 Multilab PVD coater goes a long way toward meeting the needs that arise out of these developments. Universal cathodes, Steered Arc(TM)-unbalanced-magnetron capability, ABS(TM) technology and high frequency bias are standard features. Today this unit can produce coatings from materials such as TiN, TiCN, ZrN, TiAlN, TiZrN, TiNbN and hydrogenated amorphous carbon.

引用

收藏

页码：205 / 212

页数：8

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