HIGH-ENERGY XPS USING A MONOCHROMATED AG L-ALPHA SOURCE - RESOLUTION, SENSITIVITY AND PHOTOELECTRIC CROSS-SECTIONS

被引:30
作者
EDGELL, MJ
PAYNTER, RW
CASTLE, JE
机构
关键词
D O I
10.1016/0368-2048(85)80071-2
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
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页码:241 / 256
页数:16
相关论文
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