CHEMICAL NICKEL-IRON FILMS

被引：42

作者：

SCHMECKE.AF

机构：

来源：

关键词：

D O I：

10.1149/1.2424118

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：778 / &

共 18 条

[1]

BOZORTH RM, 1951, FERROMAGNETISM, P115

[2]

BOZORTH RM, 1951, FERROMAGNETISM, V649, P115

[3]

BOZORTH RM, 1951, FERROMAGNETISM, P107

[4] DEPOSITION OF NICKEL AND COBALT BY CHEMICAL REDUCTION [J].

BRENNER, A ;

RIDDELL, G .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1947, 39 (05) :385-395

[5]

BRENNER A, 1963, ELECTRODEPOSITION AL, V1, P80

[6]

EISENBERG PH, 1958, Patent No. 2837399

[7]

FELDTKELLER E, 1965 P INT C

[8] STRUCTURE OF CHEMICALLY DEPOSITED NICKEL [J].

GOLDENSTEIN, AW ;

ROSTOKER, W ;

SCHOSSBERGER, F ;

GUTZEIT, G .

[9]

GUTZEIT G, 1956, CORROS TECHNOL, V3, P331

[10]

GUTZEIT G, 1959, 256 ASTM SPEC TECHN, P8