学术探索
学术期刊
新闻热点
数据分析
智能评审
立即登录
HIGH-RATE PHOTOCHEMICAL DEPOSITION OF AMORPHOUS-SILICON FROM HIGHER SILANES
被引:5
作者
:
DELAHOY, AE
论文数:
0
引用数:
0
h-index:
0
DELAHOY, AE
机构
:
来源
:
JOURNAL OF NON-CRYSTALLINE SOLIDS
|
1985年
/ 77-8卷
关键词
:
D O I
:
10.1016/0022-3093(85)90789-6
中图分类号
:
TQ174 [陶瓷工业];
TB3 [工程材料学];
学科分类号
:
0805 ;
080502 ;
摘要
:
引用
收藏
页码:833 / 836
页数:4
相关论文
共 2 条
[1]
DELAHOY AE, 1985, MATERIALS ISSUES APP, V49
[2]
PHOTOCHEMISTRY OF SILICON-COMPOUNDS .4. MERCURY PHOTOSENSITIZATION OF DISILANE
POLLOCK, TL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
POLLOCK, TL
SANDHU, HS
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
SANDHU, HS
JODHAN, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
JODHAN, A
STRAUSZ, OP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
STRAUSZ, OP
[J].
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1973,
95
(04)
: 1017
-
1024
←
1
→
共 2 条
[1]
DELAHOY AE, 1985, MATERIALS ISSUES APP, V49
[2]
PHOTOCHEMISTRY OF SILICON-COMPOUNDS .4. MERCURY PHOTOSENSITIZATION OF DISILANE
POLLOCK, TL
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
POLLOCK, TL
SANDHU, HS
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
SANDHU, HS
JODHAN, A
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
JODHAN, A
STRAUSZ, OP
论文数:
0
引用数:
0
h-index:
0
机构:
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
UNIV ALBERTA,DEPT CHEM,EDMONTON,ALBERTA,CANADA
STRAUSZ, OP
[J].
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY,
1973,
95
(04)
: 1017
-
1024
←
1
→