INFRARED-SPECTROSCOPY OF SI(111) SURFACES AFTER HF TREATMENT - HYDROGEN TERMINATION AND SURFACE-MORPHOLOGY

被引：444

作者：

BURROWS, VA ^{[1
]}

CHABAL, YJ ^{[1
]}

HIGASHI, GS ^{[1
]}

RAGHAVACHARI, K ^{[1
]}

CHRISTMAN, SB ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

关键词：

D O I：

10.1063/1.100053

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：998 / 1000

页数：3

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