A COMPREHENSIVE TWO-DIMENSIONAL VLSI PROCESS SIMULATION PROGRAM, BICEPS

被引:55
作者
PENUMALLI, BR
机构
关键词
D O I
10.1109/T-ED.1983.21251
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:986 / 992
页数:7
相关论文
共 19 条
  • [1] ANTONIADIS DA, 1978, 50192 STANF EL LAB T
  • [2] CHIN D, 1982, NOV P JOINT SIAM IEE
  • [3] CHIN DJ, 1981, SUPRA STANFORD U PRO
  • [4] Fair R., 1981, IMPURITY DOPING PROC
  • [5] FICHTNER W, 1982, NOV P JOINT SIAM IEE
  • [6] Furukawa S., 1972, JAPAN J APPL PHYS, V11
  • [7] GIBBONS JF, 1975, PROJECTED RANGE STAT
  • [8] GROSSE EH, 1982, NOV P JOINT SIAM IEE
  • [9] Grove A S, 1967, PHYS TECHNOLOGY SEMI
  • [10] HU SM, 1973, ATOMIC DIFFUSION SEM