THE EXPERIMENTAL TEST OF A MICROWAVE ION-BEAM SOURCE IN OXYGEN

[1] CHARACTERISTICS OF A MICROWAVE PLASMA DISK ION-SOURCE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (04) : 396 - 398

[2] DESIGN OF A MICROWAVE PLASMA CAVITY [J]. PROCEEDINGS OF THE IEEE, 1974, 62 (01) : 109 - 117

[3] THE PERFORMANCE OF A MICROWAVE ION-SOURCE IMMERSED IN A MULTICUSP STATIC MAGNETIC-FIELD [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 126 - 130

[4] DAHIMENE M, 1986, 1986 IEEE INT C PLAS, P26

[5] ROOT J, 1985, REV SCI INSTRUM, V56, P154

[6] LOW-TEMPERATURE OXIDATION OF SILICON USING A MICROWAVE PLASMA DISK SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 295 - 298

[1] CHARACTERISTICS OF A MICROWAVE PLASMA DISK ION-SOURCE [J]. APPLIED PHYSICS LETTERS, 1984, 44 (04) : 396 - 398

[2] DESIGN OF A MICROWAVE PLASMA CAVITY [J]. PROCEEDINGS OF THE IEEE, 1974, 62 (01) : 109 - 117

[3] THE PERFORMANCE OF A MICROWAVE ION-SOURCE IMMERSED IN A MULTICUSP STATIC MAGNETIC-FIELD [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 126 - 130

[4] DAHIMENE M, 1986, 1986 IEEE INT C PLAS, P26

[5] ROOT J, 1985, REV SCI INSTRUM, V56, P154

[6] LOW-TEMPERATURE OXIDATION OF SILICON USING A MICROWAVE PLASMA DISK SOURCE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 295 - 298