DIFFUSION CHARACTERISTICS OF BORON AND PHOSPHORUS IN POLYCRYSTALLINE SILICON

被引：27

作者：

BUONAQUISTI, AD

CARTER, W

HOLLOWAY, PH

机构：

来源：

THIN SOLID FILMS | 1983年 / 100卷 / 03期

关键词：

D O I：

10.1016/0040-6090(83)90281-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：235 / 248

页数：14

共 17 条

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[10] DOPANT PROFILE ANALYSIS OF BORON IN SOLAR GRADE POLYCRYSTALLINE AND SINGLE-CRYSTALLINE SILICON [J].

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