APPLICATION OF HIGH-RATE MAGNETRON SPUTTERING TO FABRICATION OF A-15 COMPOUNDS

被引：37

作者：

KAMPWIRTH, RT ^{[1
]}

HAFSTROM, JW ^{[1
]}

WU, CT ^{[1
]}

机构：

[1] ARGONNE NATL LAB, ARGONNE, IL 60439 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1977年 / 13卷 / 01期

关键词：

D O I：

10.1109/TMAG.1977.1059445

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：315 / 318

页数：4

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[9]

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