SURFACE-ANALYSIS WITH AUGER-ELECTRON SPECTROSCOPY

[1] Auger P, 1923, CR HEBD ACAD SCI, V177, P169

[2] Auger P., 1926, ANN PHYS-PARIS, V6, P183, DOI 10.1051/anphys/192610060183

[3] EXTENSION OF ELECTRON-PROMOTION MODEL TO ASYMMETRIC ATOMIC COLLISION [J]. PHYSICAL REVIEW A, 1972, 6 (01): : 211 - &

[4] AUGER-ELECTRON SPECTROSCOPIC STUDY OF SURFACE POISONING OF COPPER CATALYSTS [J]. JOURNAL OF CATALYSIS, 1974, 34 (03) : 356 - 359

[5] BROWMAN R, 1973, VACUUM, V23, P163

[6] EFFECTS OF ELECTRON-BOMBARDMENT DURING AUGER-ELECTRON ANALYSIS OF CORRODED METAL-SURFACES [J]. MATERIALS SCIENCE AND ENGINEERING, 1980, 42 (1-2): : 207 - 214

[7] APPLICATION OF DECONVOLUTION METHODS IN ELECTRON-SPECTROSCOPY - REVIEW [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1979, 16 (1-2) : 1 - 23

[8] UTILITY OF BREMSSTRAHLUNG-INDUCED AUGER PEAKS [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1979, 16 (03) : 195 - 197

[9] CONTAMINANTS ON CHEMICALLY ETCHED SILICON SURFACES - LEED-AUGER METHOD [J]. SURFACE SCIENCE, 1970, 23 (02) : 283 - &

[10] CHEMICAL EFFECTS IN OXYGEN AUGER-SPECTRA [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1976, 9 (12): : L329 - L331

[1] Auger P, 1923, CR HEBD ACAD SCI, V177, P169

[2] Auger P., 1926, ANN PHYS-PARIS, V6, P183, DOI 10.1051/anphys/192610060183

[3] EXTENSION OF ELECTRON-PROMOTION MODEL TO ASYMMETRIC ATOMIC COLLISION [J]. PHYSICAL REVIEW A, 1972, 6 (01): : 211 - &

[4] AUGER-ELECTRON SPECTROSCOPIC STUDY OF SURFACE POISONING OF COPPER CATALYSTS [J]. JOURNAL OF CATALYSIS, 1974, 34 (03) : 356 - 359

[5] BROWMAN R, 1973, VACUUM, V23, P163

[6] EFFECTS OF ELECTRON-BOMBARDMENT DURING AUGER-ELECTRON ANALYSIS OF CORRODED METAL-SURFACES [J]. MATERIALS SCIENCE AND ENGINEERING, 1980, 42 (1-2): : 207 - 214

[7] APPLICATION OF DECONVOLUTION METHODS IN ELECTRON-SPECTROSCOPY - REVIEW [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1979, 16 (1-2) : 1 - 23

[8] UTILITY OF BREMSSTRAHLUNG-INDUCED AUGER PEAKS [J]. JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1979, 16 (03) : 195 - 197

[9] CONTAMINANTS ON CHEMICALLY ETCHED SILICON SURFACES - LEED-AUGER METHOD [J]. SURFACE SCIENCE, 1970, 23 (02) : 283 - &

[10] CHEMICAL EFFECTS IN OXYGEN AUGER-SPECTRA [J]. JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1976, 9 (12): : L329 - L331