FLUORESCENCE-DETECTED X-RAY ABSORPTION-SPECTROSCOPY APPLIED TO STRUCTURAL CHARACTERIZATION OF VERY THIN-FILMS - ION-BEAM-INDUCED MODIFICATION OF THIN NI LAYERS ON SI(100)

被引：36

作者：

OYANAGI, H ^{[1
]}

MATSUSHITA, T ^{[1
]}

TANOUE, H ^{[1
]}

ISHIGURO, T ^{[1
]}

KOHRA, K ^{[1
]}

机构：

[1] NATL LAB HIGH ENERGY PHYS,PHOTON FACTORY,OHO,IBARAKI 305,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 05期

关键词：

D O I：

10.1143/JJAP.24.610

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：610 / 619

页数：10

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