学术探索
学术期刊
新闻热点
数据分析
智能评审

STRUCTURAL-CHANGES OF EVAPORATED TANTALUM DURING FILM GROWTH

被引：31
作者：
HIEBER, K
MAYER, NM
机构：
来源：
THIN SOLID FILMS | 1982年 / 90卷 / 01期
关键词：
D O I：
10.1016/0040-6090(82)90069-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：43 / 50
页数：8
相关论文
共 7 条
[1]   MEAN FREE-PATH AND DENSITY OF CONDUCTANCE ELECTRONS IN PLATINUM DETERMINED BY THE SIZE EFFECT IN EXTREMELY THIN-FILMS [J].
FISCHER, G ;
HOFFMANN, H ;
VANCEA, J .
PHYSICAL REVIEW B, 1980, 22 (12) :6065-6073
[2]   The conductivity of thin metallic films according to the electron theory of metals [J].
Fuchs, K .
PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 :100-108
[3]   STABILIZATION OF SPUTTERED BETA-TANTALUM BY A TANTALUM SILICIDE INTERLAYER [J].
HIEBER, K ;
LAUTENBACHER, E .
THIN SOLID FILMS, 1980, 66 (02) :191-196
[4]   RESISTIVITY AND TEMPERATURE COEFFICIENT OF THIN METAL FILMS WITH ROUGH SURFACE [J].
NAMBA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1970, 9 (11) :1326-&
[5]   UHV - DEPOSITED AMORPHOUS TANTALUM AND TANTALUM-NICKEL FILMS [J].
SCHAFER, A ;
MENZEL, G .
ELECTROCOMPONENT SCIENCE AND TECHNOLOGY, 1977, 4 (01) :29-35
[6]   THE MEAN FREE PATH OF ELECTRONS IN METALS [J].
SONDHEIMER, EH .
ADVANCES IN PHYSICS, 1952, 1 (01) :1-42
[7]  
[No title captured]
1