ECR SOURCES FOR THE PRODUCTION OF HIGHLY CHARGED IONS (INVITED)

被引:23
作者
LYNEIS, CM [1 ]
ANTAYA, TA [1 ]
机构
[1] MICHIGAN STATE UNIV,E LANSING,MI 48824
关键词
D O I
10.1063/1.1141881
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Electron cyclotron resonance ion sources (ECRIS) using rf between 5 and 16 GHz have been developed into stable, reliable sources of highly charged ions produced from a wide range of elements. These devices are currently used as ion sources for cyclotrons, synchrotrons, and heavy-ion linacs for nuclear and relativistic heavy-ion physics. They also serve the atomic physics community as a source of low energy multiply charged ions. In order to improve their performance both with respect to maximum charge state and beam intensity, ECRIS builders are now designing and constructing sources which will operate at frequencies up to 30 GHz. In this article we review the present status of operating ECRIS, review recent experimental measurements on plasma parameters, and look at the technology and potential of sources operating at frequencies up to 30 GHz.
引用
收藏
页码:221 / 224
页数:4
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