PICOSECOND MEASUREMENTS OF EXCITON TRAPPING IN SEMICONDUCTOR CLUSTERS

被引:49
作者
ONEIL, M
MAROHN, J
MCLENDON, G
机构
[1] Department of Chemistry, University of Rochester, Rochester
关键词
D O I
10.1016/0009-2614(90)85131-U
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The formation of deep traps in 30 Å CdS semiconductor clusters has been time resolved using picosecond single-photon counting. The trapping rates, measured by the risetime of recombinate or emission, vary inversely with trap depth ranging from ≈ 30 ps above 500 nm to < 10 ps near the band edge. These rates depend very weakly on temperature, decreasing only two-fold from 100 to 4.8 K. The observed rates are most easily explained by rapid trapping into near band edge traps, followed by slower trap-to-trap diffusion until a deep trap is encountered. © 1990.
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页码:208 / 210
页数:3
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