THERMALLY ACTUATED CMOS MICROMIRRORS

被引：31

作者：

BUHLER, J

FUNK, J

PAUL, O

STEINER, FP

BALTES, H

机构：

[1] Physical Electronics Laboratory, ETH Zurich, Zurich

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1995年 / 47卷 / 1-3期

关键词：

CMOS PROCESSES; MICROMIRRORS; TRIMORPH CANTILEVERS;

D O I：

10.1016/0924-4247(94)00964-J

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thermally actuated micromirrors fabricated using a standard CMOS process and one subsequent anisotropic silicon etch step are presented. The device consists of a mirror plate supported by bimorph cantilever beams. Even short beams show a large deflection effect. A theoretical analysis valid for n-morph bending beams has been derived and found to be consistent with experimental and computer-simulation results.

引用

页码：572 / 575

页数：4

共 7 条

[1] BIAXIAL SCANNING MIRROR ACTIVATED BY BIMORPH STRUCTURES FOR MEDICAL APPLICATIONS [J].

BUSER, RA ;

DEROOIJ, NF ;

TISCHHAUSER, H ;

DOMMANN, A ;

STAUFERT, G .

SENSORS AND ACTUATORS A-PHYSICAL, 1992, 31 (1-3) :29-34

[2]

FUNK J, 1995, SENSOR ACTUAT A-PHYS, V46, P630

[3]

JAECKLIN VP, 1993, 7TH INT C SOL STAT S, P958

[4]

Korvink J. G., 1994, Sensors and Materials, V6, P235

[5]

MOSER D, 1991, 6TH INT C SOL STAT S, P547

[6]

PAUL O, 1993, 7TH INT C SOL STAT S, P606

[7]

W-H Chu, 1993, J MICROMECH MICROENG, V3, P4

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