ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT

被引：44

作者：

LOUIS, E

VOORMA, HJ

KOSTER, NB

SHMAENOK, L

BIJKERK, F

SCHLATMANN, R

VERHOEVEN, J

PLATONOV, YY

VANDORSSEN, GE

PADMORE, HA

机构：

[1] FOM-Institute for Plasma Physics Rijnhuizen, 3430 BE Nieuwegein

[2] FOM-Institute AMOLF, 1098 SJ Amsterdam

[3] Institute for Applied Physics, Nizhny Novgorod, 603600

[4] Daresbury Laboratory, Warrington

[5] Advanced Light Source-Lawrence Berkeley Laboratory, Berkeley, CA 94720

来源：

MICROELECTRONIC ENGINEERING | 1994年 / 23卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(94)90140-6

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for lambda=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

引用

页码：215 / 218

页数：4

共 6 条

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[3] Voorma, Bijkerk, Microel. Engineering, 17, pp. 145-148, (1992)
[4] Niibe, Hayashida, Iizuka, Miyake, Watanabe, Takahashi, Fukuda, Proc. SPIE, 1343, pp. 2-9, (1990)
[5] Kloidt, Nolting, Kleineberg, Schmiedeskamp, Heinzmann, Muller, Kuhne, Appl. Phys. Lett., 58, 23, pp. 2601-2603, (1991)
[6] Puik, van der Wiel, Zeijlemaker, Verhoeven, Appl. Surf. Sc., 47, pp. 251-260, (1991)

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