INFRARED-ABSORPTION AND NUCLEAR-MAGNETIC-RESONANCE STUDIES OF CARBON NITRIDE THIN-FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

被引:86
作者
LI, D
CHUNG, YW
YANG, ST
WONG, MS
ADIBI, F
SPROUL, WD
机构
[1] NORTHWESTERN UNIV, DEPT CHEM, ANALYT SERV LAB, EVANSTON, IL 60201 USA
[2] NORTHWESTERN UNIV, BIRL IND RES LAB, EVANSTON, IL 60201 USA
[3] NORTHWESTERN UNIV, MCCORMICK SCH ENGN & APPL SCI, CTR ENGN TRIPOL, EVANSTON, IL 60208 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1994年 / 12卷 / 04期
关键词
D O I
10.1116/1.579339
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Carbon nitride thin films were prepared by dc magnetron sputtering of a graphite target in a nitrogen containing gas mixture onto Si(100) substrates held at ambient temperatures. All CN(x) coatings grown to a thickness of 1.5 mum are adherent and smooth. Infrared absorption and isotropic nitrogen labeling indicate that carbon and nitrogen are chemically bonded together. Both solid-state C-13 and N-15 magic angle spinning nuclear magnetic resonance (NMR) analyses were performed. NMR measurements indicate the presence of sp2 bonded C and N.
引用
收藏
页码:1470 / 1473
页数:4
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