RELAXATION OF MAGNETOELASTIC PHENOMENA IN ELECTRODEPOSITED NICKEL-IRON FILMS

被引：1

作者：

TYMOWSKI, J

BURKIEWICZ, K

KWIECIEN, M

LACHOWICZ, H

机构：

[1] TECH UNIV WARSAW,INST COMP TECHNOL,WARSAW,POLAND

[2] POLISH ACAD SCI,INST PHYS,WARSAW,POLAND

来源：

关键词：

D O I：

10.1016/0040-6090(75)90174-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：147 / 155

页数：9

共 10 条

GOLDBERG, N .

[2] RELAXATION OF ELASTORESISTANCE IN THIN METAL-FILMS [J].

KUWAHARA, K ;

NISHIMURA, A .

[3] MAGNETOELASTIC SENSITIVITY AND COMPOSITION OF PERMALLOY FILMS [J].

LONG, TR .

[4]

Prutton M, 1964, THIN FERROMAGNETIC F

[5]

RECKSTIN JP, 1967, J APPL PHYS, V38, P1449

[6]

SMITH DO, 1959, J APPL PHYS, V30, P264

[7]

VANBUEREN HG, 1960, IMPERFECTIONS CRYSTA, P339

[8]

VANBUEREN HG, 1960, IMPERFECTIONS CRYSTA, P236

[9]

WOLF JW, 1963, J APPL PHYS, V34, P1205

[10]

ZENER C, 1962, PROCESS CREEP FATIGU