A PREPARATION TECHNIQUE FOR TEM CROSS-SECTIONS OF TEST STRUCTURES WITH REDUCED FEATURE SIZE

被引：4

作者：

GARULLI, A

ARMIGLIATO, A

FINETTI, M

机构：

[1] CNR, Italy

来源：

ULTRAMICROSCOPY | 1988年 / 26卷 / 03期

关键词：

The authors are indebted to F. Corticelli for technical assistance and to S. Frabboni for his help in TEM observations. This work has been partially supported by CNR. Progetto Finalizzato UMateriali e Dispositivi per I'Elettronica a Stato Solido;

D O I：

10.1016/0304-3991(88)90228-8

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：295 / 300

页数：6

共 5 条

[1] ION-IMPLANTED, ELECTRON-BEAM ANNEALED TIN FILMS AS DIFFUSION-BARRIERS FOR AL ON SI SHALLOW JUNCTIONS [J].

ARMIGLIATO, A ;

FINETTI, M ;

GARRIDO, J ;

GUERRI, S ;

OSTOJA, P ;

SCORZONI, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (06) :2237-2241

[2] ANALYTICAL ELECTRON-MICROSCOPY OF AL/TIN CONTACTS ON SILICON FOR APPLICATIONS TO VERY LARGE-SCALE INTEGRATED DEVICES [J].

ARMIGLIATO, A ;

VALDRE, G .

JOURNAL OF APPLIED PHYSICS, 1987, 61 (01) :390-396

[3]

ARMIGLIATO A, 1986, PHYS STATUS SOLIDI A, V96, P799

[4] CORRELATION BETWEEN RESISTANCE BEHAVIOR AND MASS-TRANSPORT IN AL-SI/TI MULTILAYER INTERCONNECTS [J].

FINETTI, M ;

SUNI, I ;

ARMIGLIATO, A ;

GARULLI, A ;

SCORZONI, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (05) :2854-2858

[5]

GARULLI A, 1985, J MICROSC SPECT ELEC, V10, P135

← 1 →