INITIAL STEPS IN THE PHOTOCHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-SILICON

被引：54

作者：

STAFAST, H ^{[1
]}

机构：

[1] UNIV FRANKFURT, INST PHYS & THEORET CHEM, D-6000 FRANKFURT 50, FED REP GER

来源：

APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 02期

关键词：

D O I：

10.1007/BF02565194

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：93 / 102

页数：10

共 76 条

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