MODELING OF A CONTINUOUS PARALLEL PLATE PLUG FLOW ELECTROCHEMICAL REACTOR - ELECTROWINNING OF COPPER

被引：6

作者：

LAPICQUE, F

STORCK, A

机构：

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1985年 / 15卷 / 06期

关键词：

D O I：

10.1007/BF00614369

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：925 / 935

页数：11

共 11 条

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