INVESTIGATION OF THE BAND-STRUCTURE OF THE STRAINED SYSTEMS INGAAS-GAAS AND INGAAS-ALGAAS BY HIGH-PRESSURE PHOTOLUMINESCENCE

被引:33
作者
WILKINSON, VA [1 ]
PRINS, AD [1 ]
DUNSTAN, DJ [1 ]
HOWARD, LK [1 ]
EMENY, MT [1 ]
机构
[1] ROYAL SIGNALS & RADAR ESTAB,MALVERN WR14 3PS,WORCS,ENGLAND
关键词
INGAAS/GAAS; BAND OFFSETS; HIGH-PRESSURE PHOTOLUMINESCENCE;
D O I
10.1007/BF02666010
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In(x)Ga1-xAs quantum wells grown pseudomorphically in GaAs and AlGaAs with values of x up to 0.25 have been studied by photoluminescence under high hydrostatic pressure. We concentrate here on the pressure range where the emissions quench and take on the characteristics of the X-minima. In the InGaAs/GaAs structures, these transitions display an unexpected pressure coefficient, -2.6 meV/kbar, twice that of the X minima in GaAs. We assign these transitions to the X minima in the wells, and therefore make a direct measurement of the strained X positions as a function of composition. In the InGaAs/AlGaAs structures the crossovers occur against the X-minima in the barriers and these crossovers yield an accurate value for the band offset ratio for InGaAs/GaAs heterojunctions which is found to be 60:40 (CB:VB).
引用
收藏
页码:509 / 516
页数:8
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