MICROWAVE PERFORMANCE OF A 0.25 MU-M GATE ALGAN/GAN HETEROSTRUCTURE FIELD-EFFECT TRANSISTOR

被引:324
作者
KHAN, MA
KUZNIA, JN
OLSON, DT
SCHAFF, WJ
BURM, JW
SHUR, MS
机构
[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14853
[2] UNIV VIRGINIA,DEPT ELECT ENGN,CHARLOTTESVILLE,VA 22903
关键词
D O I
10.1063/1.112116
中图分类号
O59 [应用物理学];
学科分类号
摘要
We fabricated a 0.25 mum gate length AlGaN/GaN heterostructure field effect transistor (HFET) with a maximum extrinsic transconductance of 27 mS/mm (at room temperature) limited by the source series resistance. The device exhibited an excellent pinch-off and a low parasitic output conductance in the saturation regime. We measured the cutoff frequency f(T) and the maximum oscillation frequency f(max) as 11 and 35 GHz, respectively. These values are superior to the highest reported values for field effect transistors based on other wide band-gap semiconductors such as SiC. These results demonstrate an excellent potential of AlGaN/GaN HFETs for microwave and millimeter wave applications.
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收藏
页码:1121 / 1123
页数:3
相关论文
共 7 条
[1]   MONTE-CARLO SIMULATION OF ELECTRON-TRANSPORT IN GALLIUM NITRIDE [J].
GELMONT, B ;
KIM, K ;
SHUR, M .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (03) :1818-1821
[2]  
KHAN MA, 1993, APPL PHYS LETT, V63, P1214, DOI 10.1063/1.109775
[3]  
KHAN MA, 1993, APPL PHYS LETT, V62, P1786, DOI 10.1063/1.109549
[4]  
LEE K, 1993, SEMICONDUCTOR DEVICE, P450
[5]   MONTE-CARLO CALCULATION OF VELOCITY-FIELD RELATIONSHIP FOR GALLIUM NITRIDE [J].
LITTLEJOHN, MA ;
HAUSER, JR ;
GLISSON, TH .
APPLIED PHYSICS LETTERS, 1975, 26 (11) :625-627
[6]  
PALMOUR JW, 1993, 2ND P INT SEM DEV RE, P695
[7]  
PANKOVE JI, 1971, RCA REV, V32, P383