The temperature dependence of ferroelectric imprint

被引:14
作者
Benedetto, JM
Roush, ML
Lloyd, IK
Ramesh, R
Rychlik, B
机构
[1] UNIV MARYLAND,COLLEGE PK,MD 20742
[2] CARNEGIE MELLON UNIV,PITTSBURGH,PA 15213
关键词
D O I
10.1080/10584589508012284
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Unidirectional voltage pulse stressing can induce a significant amount of asymmetry in the retention characteristics in certain LSCO/PLZT/LSCO thin films. A large asymmetry was developed within 1000 s of unidirectional pulsing with a 100-Hz (50% duty cycle) square wave at 125 degrees C while no significant retention asymmetry was developed at 25 degrees C in the same time frame. The change in respective switched and non-switched polarizations after voltage pulse stressing follow an Arrhenius behavior. The thermal activation energies (E(a)) derived from the Arrhenius plots are E(a) = 0.21 eV for the change in switched polarization and an E(a) = 0.56 eV for the change in non-switched polarization.
引用
收藏
页码:279 / 288
页数:10
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