FABRICATION AND BASIC CHARACTERISTICS OF DRY-ETCHED MICRO INDUCTORS

被引：23

作者：

YAMAGUCHI, M

MATSUMOTO, M

OHZEKI, H

ARAI, KI

机构：

[1] Research Institute of Electrical Communication, Tohoku University, Aoba Ku, Sendai 980

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1990年 / 26卷 / 05期

关键词：

D O I：

10.1109/20.104602

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Thin film meander inductors having 10-6m range coil spacing were fabricated successfully. The inductance measured with microstrip line increased with increasing the coil spacing due to the dielectric coupling between the meander lines. Maximum value of the applicable current density is examined and it is clarified that the magnetic thin films are requested to provide high saturation magnetization in order to remain in the under saturated region in case of high current density applications. These results give a basis for developing thin film micro inductors and transformers. © 1990 IEEE

引用

页码：2014 / 2016

页数：3