THE USE OF XPS VALENCE-BAND SPECTRA IN THE STUDY OF PLASMA-DEPOSITED POLYMERIC FILMS OF TETRAMETHYLDISILOXANE OR HYDROXYETHYLMETHACRYLATE

被引：2

作者：

GARBASSI, F

MORRA, M

OCCHIELLO, E

POZZI, L

机构：

[1] Polymeric Materials Department, Istituto G. Donegani, Enichem, Novara, 28100

[2] Nobil Bio Ricerche, Villafranca D'asti, 14018, Strada S. Rocco

来源：

SURFACE AND INTERFACE ANALYSIS | 1994年 / 22卷 / 1-12期

关键词：

D O I：

10.1002/sia.7402201103

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Thin polymeric films were deposited from tetramethyldisiloxane (TMDSO) and hydroxyethylmethacrylate (HEMA) plasma. X-ray photoelectron spectroscopy (XPS) and XPS valence band (XPS-VB) analyses were performed to detect the effect of the deposition conditions on the structure of the plasma-deposited films. In both cases XPS-VB spectra were found strongly affected by the deposition conditions. Furthermore, XPS-VB analysis can be used to obtain information on the structure and performances of these classes of plasma-deposited polymer films.

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页码：485 / 490

页数：6

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