COMPUTER-SIMULATION OF DAMAGE PROCESSES DURING ION-IMPLANTATION

被引：26

作者：

KANG, HJ

SHIMIZU, R

SAITO, T

YAMAKAWA, H

机构：

[1] OSAKA UNIV,DEPT APPL PHYS,SUITA,OSAKA 565,JAPAN

[2] ULVAC CORP,DIV RES & DEV,CHIGASAKI,KANAGAWA 253,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 07期

关键词：

D O I：

10.1063/1.339400

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2733 / 2737

页数：5

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