INTERFACIAL REACTION BETWEEN NI AND MBE-GROWN SIGE ALLOY

被引：52

作者：

THOMPSON, RD

TU, KN

ANGILLELO, J

DELAGE, S

IYER, SS

机构：

[1] IBM T.J.Watson Research Cent, United States

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 12期

关键词：

D O I：

10.1149/1.2095522

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：3161 / 3163

页数：3

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[2]

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[4]

MASSALIKI TB, 1986, BINARY ALLOY PHASE D

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TING CY, 1982, ELECTROCHEM SOC P, V827, P224

[6]

Tu K.N., 1974, J APPL PHYS S, V2, P669

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[8] 1ST PHASE TO NUCLEATE IN PLANAR TRANSITION METAL-GERMANIUM INTERFACES [J].

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THIN SOLID FILMS, 1977, 42 (01) :51-59

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