COMPARISON BETWEEN BULK AND SURFACE SELF-DIFFUSION CONSTANTS OF SI AND O IN VITREOUS SILICA

被引:10
作者
GAROFALINI, SH
CONOVER, S
机构
[1] Rutgers Univ, Dep of Ceramics,, Piscataway, NJ, USA, Rutgers Univ, Dep of Ceramics, Piscataway, NJ, USA
关键词
MOLECULAR DYNAMICS COMPUTER SIMULATION TECHNIQUE;
D O I
10.1016/0022-3093(85)90411-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The molecular dynamics (MD) computer simulation technique offers a method for studying the v- SiO//2 surface at an atomic level. In this article, this technique was used to simulate the motion of atoms in a pristine v-SiO//2 surface using a fifth order Nordsieck algorithm. A modified Born-Mayer-Huggins potential was used as the effective pairwise potential.
引用
收藏
页码:171 / 176
页数:6
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