PREPARATION AND ELECTRICAL-PROPERTIES OF TI-TIO2-METAL THIN-FILM STRUCTURES

被引：6

作者：

JANKOWSKI, B ^{[1
]}

机构：

[1] TECH UNIV WROCLAW,INST ELECTR TECHNOL,WROCLAW,POLAND

来源：

关键词：

D O I：

10.1016/0040-6090(76)90130-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：69 / 72

页数：4

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[4]

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[5]

Jonscher A. K., 1972, J NONCRYST SOLIDS, V810, P293, DOI DOI 10.1016/0022-3093(72)90151-2

[6]

Lampert M.A., 1970, CURRENT INJECTION SO

[7]

LLOYD P, 1965, BRIT COMMUN ELECTRON, V6, P363

SHOUSHA, AHM ;

YOUNG, L .