OBSERVATIONS OF ARGON EMISSION-LINES USED FOR FLUORINE ATOM ACTINOMETRY IN LOW POER RF DISCHARGES

被引：28

作者：

SAVAS, SE ^{[1
]}

机构：

[1] IBM CORP,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 16期

关键词：

D O I：

10.1063/1.96642

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1042 / 1044

页数：3

共 14 条

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[5] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES [J].

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[6] ANISOTROPIC ETCHING OF SIO2 IN LOW-FREQUENCY CF4/O2 AND NF3/AR PLASMAS [J].

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[9]

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[10]

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