A METHOD FOR MEASURING OHMIC RESISTANCE OF SOLUTION LAYERS AT GAS-EVOLVING ELECTRODES

被引：11

作者：

BOTTER, W ^{[1
]}

TESCHKE, O ^{[1
]}

机构：

[1] UNIV CAMPINAS,INST FIS,BR-13081 CAMPINAS,SP,BRAZIL

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1991年 / 138卷 / 04期

关键词：

D O I：

10.1149/1.2085709

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A method for measuring ohmic resistance of solution layers at gas-evolving electrodes was developed and tested. The method was applied to hydrogen and oxygen-evolving electrodes, and the resistance of their adjacent solution layers (for a 9 mm electrode separator gap) causes a negligible IR drop. For 3 mm gaps at a current density of 300 mA/cm2, the IR drop of the solution layer increases to 25 mV. Contact resistances at the various electrode connections are shown to have a measurable contribution which increases with electrolysis time.

引用

页码：1028 / 1033

页数：6

共 14 条

[1] THE INFLUENCE OF THE LUGGIN CAPILLARY ON THE RESPONSE-TIME OF A REFERENCE ELECTRODE [J].