STACKING DEFECTS IN C-60 FILMS

被引：10

作者：

MANCIU, M ^{[1
]}

MANAILA, R ^{[1
]}

DEVENYI, A ^{[1
]}

机构：

[1] EOTVOS LORAND UNIV, INST INORGAN & ANALYT CHEM, H-1443 BUDAPEST, HUNGARY

来源：

FULLERENE SCIENCE AND TECHNOLOGY | 1994年 / 2卷 / 03期

关键词：

D O I：

10.1080/15363839408009551

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The structure of pollycrystalline C60 films prepared by sublimation from 99.9% pure C60 powder and from graphite soot was investigated by X-ray diffraction. A complex fcc (111) line was found in the former samples. Comparison of experimental and simulated (111) profiles allowed to assess quantitatively the degree of stacking disorder introduced during the growth of the film. Probabilities could be derived for continuation of already started fcc and hcp sequences, thereby characterizing the statistical microstructure of the C60 films. Also, the relative magnitudes of inter- and intra-layer disorder can be estimated. The films deposited from graphite soot show a high structural disorder.

引用

页码：255 / 289

页数：35

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