AN EXPERIMENTAL AND THEORETICAL-STUDY OF THE INFRARED REFLECTANCE OF THIN OXIDE-FILMS ON METALS

被引：30

作者：

OTTESEN, DK

机构：

[1] Sandia Natl Lab, Livermore, CA, USA, Sandia Natl Lab, Livermore, CA, USA

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 09期

关键词：

D O I：

10.1149/1.2114330

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2250 / 2257

页数：8

共 35 条

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[3]

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