MORPHOLOGICAL EFFECTS IN THE QUANTUM YIELD OF CESIUM IODIDE

被引:17
作者
ALMEIDA, J
BARBO, F
BERTOLO, M
BIANCO, A
BRAEM, A
CERASARI, S
COLUZZA, C
DELLORTO, T
FONTANA, S
MARGARITONDO, G
NAPPI, E
PAIC, G
PIUZ, F
SANJINES, R
SCOGNETTI, T
SGOBBA, S
机构
[1] PH ECUBLENS,EPFL,IPA,DP,CH-1015 LAUSANNE,SWITZERLAND
[2] SINCROTRONE TRIESTE,I-34012 TRIESTE,ITALY
[3] CERN,DIV PPE,CH-1211 GENEVA 23,SWITZERLAND
[4] IST NAZL FIS NUCL,I-70126 BARI,ITALY
关键词
D O I
10.1016/0168-9002(95)00141-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We demonstrated that polycrystalline cesium iodide (CsI) on large area Ni/Au coated printed board provides a quantum efficiency (QE) higher by a factor of 2 than the films deposited on the standard Cu/Au printed circuits. This is the most important result of the present systematic study of the QE lateral inhomogeneity for CsI on different substrates. We found a strong correlation between the QE lateral variation and the morphological homogeneity of the films. The QE was measured by UV photoelectron emission microscopy and spatially resolved X-ray photoemission, and the morphology studies were performed by secondary electron microscopy, X-ray diffraction and scanning tunneling microscopy.
引用
收藏
页码:524 / 538
页数:15
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